Products

Huntsman

Matching Product Technologies (3)

18 Products found on Huntsman

Choline Hydroxide banner
Huntsman company logo
HuntsmanCholine Hydroxide
  • Product Functions:Etchant
  • Chemical Family:Quaternary Ammonium Compounds
  • Product End Uses:Etching, Metal Removal, Photoresists, Semiconductors
  • Product Features:High Purity, High pH, Low Corrosion, Low Toxicity

E-GRADE® Choline Hydroxide is a clear aqueous solution with a high pH and a mild odor. It has a very low corrosion rate on copper and other metallic surfaces and has been demonstrated to effectively remove both positive and negative photoresists. The product is an effective replacement for TMAH and is available in higher concentrations than TMAH in both water and organic solvents (for R&D). The combination of low corrosion rates, photoresist removal, etching, and lower toxicity makes E-GRADE® Choline Hydroxide an effective, safer-to-handle alternative to TMAH in next-generation semiconductor cleans, with performance enhancements such as faster photoresist removal rates and selective metal removal rates.

 

The information, specifications, and materials provided with this product are for general informational purposes only and are subject to change without notice. The product is provided “as is” without any warranties, express or implied, including but not limited to warranties of merchantability, fitness for a particular purpose, or non-infringement. Users are responsible for ensuring the product is suitable for their intended application and for following all applicable safety guidelines and instructions.

The information, specifications, and materials accessible here may not reflect the most current version. Please use the Request a Document feature for the most current product documentation available.

E-GRADE® THEMAH banner
Huntsman company logo
HuntsmanE-GRADE® THEMAH
  • Product Functions:Cleaning Agent, Solvent
  • Chemical Family:Chemical Mixtures & Blends
  • Product End Uses:Chemical Mechanical Planarization (CMP), Etching, Photoresist Stripper, Photoresists, Printed Circuit Board (PCB), Semiconductor Etching, Semiconductors
  • Product Features:Ease of Processing, Good Solubility, High Purity, High pH, Low Corrosion, Low Trace Metals, Low Volatility, Reduces Processing Time

E-GRADE® THEMAH provides safer handling alternatives to tetramethylammonium hydroxide (TMAH). Both are strong, metal ion-free organic bases suited for etching silicon and for photoresist developing and stripping applications. In addition, Huntsman has developed a library of many new experimental quaternary ammonium compounds (quats), enabling a range of products for different applications. These are available in aqueous and solvent-based formulations. Huntsman’s platform of TMAH alternatives is being developed with the aspiration of providing less toxic alternatives to TMAH for the next generation of semiconductor cleans.

 

The information, specifications, and materials provided with this product are for general informational purposes only and are subject to change without notice. The product is provided “as is” without any warranties, express or implied, including but not limited to warranties of merchantability, fitness for a particular purpose, or non-infringement. Users are responsible for ensuring the product is suitable for their intended application and for following all applicable safety guidelines and instructions.

The information, specifications, and materials accessible here may not reflect the most current version. Please use the Request a Document feature for the most current product documentation available.

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