Enhanced TDS
Identification & Functionality
- Chemical Family
- Chemical Name
- Function
- Etchant, Cleaner
- Industrial Additives Functions
- Technologies
- Product Families
- Chemical Structure
Features & Benefits
- Industrial Additives Features
- Product Features
- Organic base
- High purity, low trace metal
- Available at 45 wt%
- Water or solvent based
- TMAH replacement
- Developer, stripper, and PERR
- Etching agent
- CMP slurries and pCMP Cleans
Applications & Uses
- Applicable Processes
- Industrial Additives End Use
- Markets
- Applications
Properties
- Physical Form
- Notes
* Thickness measured with Napson Cresbox 4 point-probe tester and Filmetrics.
Regulatory & Compliance
Technical Details & Test Data
- Treatment of Copper Wafer
- Cu wafer treated with E-GRADE® THEMAH and E-GRADE® CHOLINE HYDROXIDE demonstrated smoother surfaces comparing to Cu treated with TMAH.
- TMAH diagram
- Silicon wafers, etched with E-GRADE® Choline Hydroxide, demonstrate significant reductions in reflectivity and improvement in uniformity when compared to wafers treated with TMAH. This texturization reduces light reflection and improves absorption for photovoltaic devices.
- Positive tone Novolak photoresist is well developed at room temperature with E-GRADE® Choline Hydroxide.
- pH Dependance
- Concentration dependence of pH values for TMAH and Choline in water.
- TiN Etch with Hydrogen Peroxide
- At proper pH and concentration, E-GRADE® Choline Hydroxide with H₂O₂ can be used for TiN etch (etch rate > 20 nm/min). The degradation rate of H₂O₂ with Choline Hydroxide was observed to be much slower than with TMAH. Degradation rate is based on 24 hr average at 45°C.
H₂O₂ (wt %) Quat pH at 45℃ TiN (nm/min) Cu (nm/min) H₂O₂ degradation (%/hr)
8.0% TMAH 7.96 18.67 -0.31 0.071 COH 8.05 19.02 0.39 0.058 9.6% TMAH 8.07 33.3 0.66 0.148 COH 8.03 24.66 0.47 0.098 - Photoresist Development - Concentration Dependence
- Choline Hydroxide, XHE-125, and XHE-128 have comparable developing rates relative to 2.38 wt% TMAH for positive PR
- Developing rates can be optimized across a broad working window
- Developing rates are linear with concentration, above a minimum concentration
- Choline Hydroxide demonstrated good performance for negative PR
- XHE-125 has similar performance, increasing the concentration to 5 wt% to match 2.38 wt% TMAH
- Developing rates have a linear relationship with concentration, even at low concentrations
Packaging & Availability
- Regional Availability
Other
- Appearance (SDS)
- Liquid
- Color (SDS)
- Clear
- Odor (SDS)
- Mild amine-like
- Chemical Properties
Value Units Test Method / Conditions pH 2.58 - - Physical Properties
Value Units Test Method / Conditions Molecular Weight 121.0 g/mol g/mol