E-GRADE® Choline Hydroxide is a clear aqueous solution with a high pH and a mild odor. It has a very low corrosion rate on copper and other metallic surfaces and has been demonstrated to effectively remove both positive and negative photoresists. The product is an effective replacement for TMAH and is available in higher concentrations than TMAH in both water and organic solvents (for R&D). The combination of low corrosion rates, photoresist removal, etching, and lower toxicity makes E-GRADE® Choline Hydroxide an effective, safer-to-handle alternative to TMAH in next-generation semiconductor cleans, with performance enhancements such as faster photoresist removal rates and selective metal removal rates.
The information, specifications, and materials provided with this product are for general informational purposes only and are subject to change without notice. The product is provided “as is” without any warranties, express or implied, including but not limited to warranties of merchantability, fitness for a particular purpose, or non-infringement. Users are responsible for ensuring the product is suitable for their intended application and for following all applicable safety guidelines and instructions.
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