Products

E-GRADE® Diglycolamine® Agent (E-GRADE® DGA® Agent) is a liquid solvent used in gas treatment processes. It is miscible in water and serves as an industrial additive solvent.

E-GRADE® Dimethylethanolamine (E-GRADE® DMEA) is a high-purity, water-soluble liquid used in automotive, displays, electrical and electronics, printed circuit boards (PCBs), and semiconductor manufacturing. It is designed for etching applications, offering low trace metals, low vapor pressure, and is ideal for electronics and semiconductor industries.

E-GRADE® Dimethylethanolamine 50 (E-GRADE® DMEA 50) is a high-purity, water-soluble liquid used in automotive, displays, printed circuit boards (PCBs), and semiconductor manufacturing. It serves as an intermediate in etching applications, offering low trace metals, low vapor pressure, and is ideal for electronics and semiconductor industries.

E-GRADE® Ethylenediamine (E-GRADE® EDA) is primarily used in stripping, cleaning, and wet etching formulations in the semiconductor, display, and PCB industries. Most are water-soluble and contain aminoglycol or polyether structures where both the amine and glycol functions contribute to their performance. The range of primary, secondary, and tertiary amines and structures allows the selection of base strength and corrosion rates based on the needs of the application.

E-GRADE® Methylcyclohexane (E-GRADE® MCH) is primarily used in stripping, cleaning, and wet etching formulations in the semiconductor, display, and PCB industries. Most are water-soluble and contain aminoglycol or polyether structures where both the amine and glycol functions contribute to their performance. The range of primary, secondary, and tertiary amines and structures allows the selection of base strength and corrosion rates based on the needs of the application.

E-GRADE® Methyldiethanolamine (E-GRADE® MDEA) is primarily used in stripping, cleaning, and wet etching formulations in the semiconductor, display, and PCB industries. Most are water-soluble and contain aminoglycol or polyether structures where both the amine and glycol functions contribute to their performance. The range of primary, secondary, and tertiary amines and structures allows the selection of base strength and corrosion rates based on the needs of the application.

E-GRADE® Monomethylethanolamine (E-GRADE® MMEA) is primarily used in stripping, cleaning, and wet etching formulations in the semiconductor, display, and PCB industries. Most are water-soluble and contain aminoglycol or polyether structures where both the amine and glycol functions contribute to their performance. The range of primary, secondary, and tertiary amines and structures allows the selection of base strength and corrosion rates based on the needs of the application.

E-GRADE® Morpholine is primarily used in stripping, cleaning, and wet etching formulations in the semiconductor, display, and PCB industries. Most are water-soluble and contain aminoglycol or polyether structures where both the amine and glycol functions contribute to their performance. The range of primary, secondary, and tertiary amines and structures allows the selection of base strength and corrosion rates based on the needs of the application.

E-GRADE® Morpholinoethanol (E-GRADE® HEM) is primarily used in stripping, cleaning, and wet etching formulations in the semiconductor, display, and PCB industries. Most are water-soluble and contain aminoglycol or polyether structures where both the amine and glycol functions contribute to their performance. The range of primary, secondary, and tertiary amines and structures allows the selection of base strength and corrosion rates based on the needs of the application.

E-GRADE® Nmethylmorpholine Oxide (E-GRADE® NMMO) is primarily used in stripping, cleaning, and wet etching formulations in the semiconductor, display, and PCB industries. Most are water-soluble and contain aminoglycol or polyether structures where both the amine and glycol functions contribute to their performance. The range of primary, secondary, and tertiary amines and structures allows the selection of base strength and corrosion rates based on the needs of the application.

E-GRADE® Pentamethyldiethylenetriamine (E-GRADE® PMDETA) is primarily used in stripping, cleaning, and wet etching formulations in the semiconductor, display, and PCB industries. Most are water-soluble and contain aminoglycol or polyether structures where both the amine and glycol functions contribute to their performance. The range of primary, secondary, and tertiary amines and structures allows the selection of base strength and corrosion rates based on the needs of the application.

E-GRADE® Propylene Carbonate (E-GRADE® PC) is primarily used in stripping, cleaning, and wet etching formulations in the semiconductor, display, and PCB industries. Most are water-soluble and contain aminoglycol or polyether structures where both the amine and glycol functions contribute to their performance. The range of primary, secondary, and tertiary amines and structures allows the selection of base strength and corrosion rates based on the needs of the application.

E-GRADE® Sulfolane is a liquid processing aid used in automotive and transportation and semiconductor manufacturing applications. It offers effective performance in various industrial processes, providing support in specific chemical and material processing tasks.

E-GRADE® THEMAH provides safer handling alternatives to tetramethylammonium hydroxide (TMAH). Both are strong, metal ion-free organic bases suited for etching silicon and for photoresist developing and stripping applications. In addition, Huntsman has developed a library of many new experimental quaternary ammonium compounds (quats), enabling a range of products for different applications. These are available in aqueous and solvent-based formulations. Huntsman’s platform of TMAH alternatives is being developed with the aspiration of providing less toxic alternatives to TMAH for the next generation of semiconductor cleans.

E-GRADE® Tetraethylenepentamine (E-GRADE® TEPA) is primarily used in stripping, cleaning, and wet etching formulations in the semiconductor, display, and PCB industries. Most are water-soluble and contain aminoglycol or polyether structures where both the amine and glycol functions contribute to their performance. The range of primary, secondary, and tertiary amines and structures allows the selection of base strength and corrosion rates based on the needs of the application.