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Dimethylethanolamine - 50% (DMEA 50)
Chemical Name:
Dimethylethanolamine (DMEA)
Chemical Family:
Amines
Labeling Claims:
Suspended Matter-free
Dimethylethanolamine - 50% (DMEA 50) is a clear, colorless, mobile liquid with an ammoniacal odor. Since the product contains both a tertiary amine group and a hydroxyl group, it undergoes reactions typical of amines and alcohols.
Huntsman
E-GRADE® 1,3-dimethyl-2-imidazolidinone (E-GRADE® DMEU)
Functions:
Dispersant, Etchant, Solvent
Chemical Family:
Amines
End Uses:
Printed Circuit Boards, Semiconductor
Applicable Processes:
Semiconductor Etching, Semiconductor Manufacturing
Features:
Easy Handling, Excellent Chemical Stability, Good Solubility, Good Solvency, Good Thermal Stability, High Purity, Low Trace Metals, Low Vapor Pressure, Water Soluble, Wide Temperature Operating Range
E-GRADE® 1,3-dimethyl-2-imidazolidinone (E-GRADE® DMEU) is primarily used in stripping, cleaning, and wet etching formulations in the semiconductor, display, and PCB industries. Most are water-soluble and contain aminoglycol or polyether structures where both the amine and glycol functions contribute to their performance. The range of primary, secondary, and tertiary amines and structures allows the selection of base strength and corrosion rates based on the needs of the application.
Huntsman
E-GRADE® 3-methyl-2-oxazolidinone (E-GRADE® MEOX)
Functions:
Solvent
Chemical Family:
Amines
End Uses:
Batteries, Electronics, Lithium-Ion Batteries, Semiconductor, ̇Photoresists
Applicable Processes:
Etching Applications, Semiconductor Etching, Semiconductor Manufacturing
Features:
Easy Handling, Faster Stripping, Good Rinseability, Good Solubility, Good Solvency, Good Thermal Stability, High Flash Point, Low Odor, Low Trace Metals, Low Vapor Pressure, Water Soluble, Wide Temperature Operating Range
E-GRADE® 3-methyl-2-oxazolidinone (E-GRADE® MEOX) is primarily used in stripping, cleaning, and wet etching formulations in the semiconductor, display, and PCB industries. Most are water-soluble and contain aminoglycol or polyether structures where both the amine and glycol functions contribute to their performance. The range of primary, secondary, and tertiary amines and structures allows the selection of base strength and corrosion rates based on the needs of the application.
Huntsman
E-GRADE® Aminoethylethanolamine (E-GRADE® AEEA)
Chemical Name:
2-(2-aminoethylamino)ethanol
Chemical Family:
Alkanolamines
E-GRADE® Aminoethylethanolamine (E-GRADE® AEEA) is a liquid amine used as an intermediate in automotive and transportation and semiconductor manufacturing applications. It is not listed under California Proposition 65, making it suitable for use in various industries requiring amine-based intermediates. It is also a low molecular weight product with both a primary and a secondary amine and a hydroxyl group.
Huntsman
E-GRADE® Aminoethylpiperazine 40 (E-GRADE® AEP 40)
Applications:
Adhesives & Sealants, Automotive & Transportation, Building & Construction
Product Families:
Battery & Electronic Materials
Chemical Family:
Amines
End Uses:
Semiconductor, Electronics
E-GRADE® Aminoethylpiperazine 40 (E-GRADE® AEP 40) is a liquid used in automotive and transportation, parts and components, and battery and electronic materials applications. It is designed for use in electronics, providing effective performance as an industrial additive in various electronic manufacturing processes.
Huntsman
E-GRADE® Aminopropylmonomethylethanolamine (E-GRADE® APMMEA)
Chemical Family:
Amines
End Uses:
Electronics, Printed Circuit Boards, Semiconductor
Applicable Processes:
Etching Applications, Metal Removal, Semiconductor Etching, Semiconductor Manufacturing
Features:
Faster Stripping, High Purity, Low Trace Metals, Low Vapor Pressure, Water Soluble
E-GRADE® Aminopropylmonomethylethanolamine (E-GRADE® APMMEA) is primarily used in stripping, cleaning, and wet etching formulations in the semiconductor, display, and PCB industries. Most are water-soluble and contain aminoglycol or polyether structures where both the amine and glycol functions contribute to their performance. The range of primary, secondary, and tertiary amines and structures allows the selection of base strength and corrosion rates based on the needs of the application.
Huntsman
E-GRADE® Aminopropylmorpholine (E-GRADE® APM)
Chemical Family:
Amines
End Uses:
Electronics, Printed Circuit Boards, Semiconductor
Applicable Processes:
Etching Applications, Metal Removal, Semiconductor Etching
Features:
Faster Stripping, High Purity, Low Trace Metals, Low Vapor Pressure, Water Soluble
E-GRADE® Aminopropylmorpholine (E-GRADE® APM) is primarily used in stripping, cleaning, and wet etching formulations in the semiconductor, display, and PCB industries. Most are water-soluble and contain aminoglycol or polyether structures where both the amine and glycol functions contribute to their performance. The range of primary, secondary, and tertiary amines and structures allows the selection of base strength and corrosion rates based on the needs of the application.
Huntsman
E-GRADE® BHEMAH PG
Applications:
Automotive & Transportation, Semiconductor Manufacturing
Product Families:
Processing Aids
Chemical Family:
Chemical Mixtures & Blends
End Uses:
Semiconductor
E-GRADE® BHEMAH PG is a liquid processing aid used in automotive and transportation and semiconductor manufacturing. It is water-soluble, making it suitable for various applications in these industries that require water-based formulations. E-GRADE® BHEMAH PG is a solvent solution of bis(2-hydroxyethyl)dimethylammonium hydroxide. It is a clear, high pH liquid with a mild odor.
Huntsman
E-GRADE® Choline Hydroxide
Chemical Name:
Choline, hydroxide
Functions:
Etchant, Etchant, Photo Resist Stripper
Chemical Family:
Quaternary Ammonium Compounds
End Uses:
Agrochemicals, Chemical Mechanical Planarization (CMP) Slurries, Electronic Components, Electronics, Post-Chemical Mechanical Planarization (pCMP) Cleaning Solution, Semiconductor, Semiconductor
Applicable Processes:
Etching Applications, Photoresist Strippers Manufacturing, Semiconductor Etching
Features:
High Purity, High pH, High pH, Low Corrosion, Low Corrosion Rates, Low Toxicity, Low Toxicity, Low Trace Metals, Remove Photoresists
E-GRADE® Choline Hydroxide is a clear aqueous solution with a high pH and a mild odor. It has been found to have a very low corrosion rate to copper and other metallic surfaces and has been demonstrated to effectively remove both positive and negative photoresists.
Huntsman
E-GRADE® Diethylenetriamine (E-GRADE® DETA)
Functions:
Hardener
Chemical Family:
Amines
End Uses:
Electronics, Printed Circuit Boards, Semiconductor
Applicable Processes:
Etching Applications, Metal Removal, Semiconductor Etching, Semiconductor Manufacturing
Features:
High Purity, Low Trace Metals, Low Vapor Pressure, Water Soluble
E-GRADE® Diethylenetriamine (E-GRADE® DETA) is a high-purity, water-soluble liquid used in automotive, displays, printed circuit boards (PCBs), and semiconductor manufacturing. It serves as a hardener in etching applications, offering low trace metals, low vapor pressure, and is ideal for electronics and semiconductor industries.
Huntsman
E-GRADE® Diglycolamine® Agent (E-GRADE® DGA® Agent)
Applications:
Chemical & Industrial Manufacturing, Semiconductor Manufacturing
Product Families:
Industrial Additives & Materials
End Uses:
Semiconductor
E-GRADE® Diglycolamine® Agent (E-GRADE® DGA® Agent) is a liquid solvent used in gas treatment processes. It is miscible in water and serves as an industrial additive solvent.
Huntsman
E-GRADE® Dimethylethanolamine (E-GRADE® DMEA)
Chemical Family:
Amines
End Uses:
Electronics, Printed Circuit Boards, Semiconductor
Applicable Processes:
Etching Applications, Metal Removal, Semiconductor Etching, Semiconductor Manufacturing
Features:
High Purity, Low Trace Metals, Low Vapor Pressure, Water Soluble
E-GRADE® Dimethylethanolamine (E-GRADE® DMEA) is a high-purity, water-soluble liquid used in automotive, displays, electrical and electronics, printed circuit boards (PCBs), and semiconductor manufacturing. It is designed for etching applications, offering low trace metals, low vapor pressure, and is ideal for electronics and semiconductor industries.
Huntsman
E-GRADE® Dimethylethanolamine 50 (E-GRADE® DMEA 50)
Chemical Name:
Dimethylethanolamine (DMEA)
Functions:
Intermediate
Chemical Family:
Amines
End Uses:
Electronics, Printed Circuit Boards, Semiconductor
Grade:
Electronic Grade
Applicable Processes:
Etching Applications, Metal Removal, Semiconductor Manufacturing
Features:
High Purity, Low Trace Metals, Low Vapor Pressure, Water Soluble
E-GRADE® Dimethylethanolamine 50 (E-GRADE® DMEA 50) is a high-purity, water-soluble liquid used in automotive, displays, printed circuit boards (PCBs), and semiconductor manufacturing. It serves as an intermediate in etching applications, offering low trace metals, low vapor pressure, and is ideal for electronics and semiconductor industries.
Huntsman
E-GRADE® Ethylenediamine (E-GRADE® EDA)
Chemical Family:
Amines
End Uses:
Electronics, Printed Circuit Boards, Semiconductor
Applicable Processes:
Etching Applications, Metal Removal, Semiconductor Etching, Semiconductor Manufacturing
Features:
Faster Stripping, High Purity, Low Trace Metals, Low Vapor Pressure, Water Soluble
E-GRADE® Ethylenediamine (E-GRADE® EDA) is primarily used in stripping, cleaning, and wet etching formulations in the semiconductor, display, and PCB industries. Most are water-soluble and contain aminoglycol or polyether structures where both the amine and glycol functions contribute to their performance. The range of primary, secondary, and tertiary amines and structures allows the selection of base strength and corrosion rates based on the needs of the application.
Huntsman
E-GRADE® Methylcyclohexane (E-GRADE® MCH)
Chemical Family:
Amines
End Uses:
Electronics, Printed Circuit Boards, Semiconductor
Applicable Processes:
Etching Applications, Metal Removal, Semiconductor Etching, Semiconductor Manufacturing
Features:
Faster Stripping, High Purity, Low Trace Metals, Low Vapor Pressure, Water Soluble
E-GRADE® Methylcyclohexane (E-GRADE® MCH) is primarily used in stripping, cleaning, and wet etching formulations in the semiconductor, display, and PCB industries. Most are water-soluble and contain aminoglycol or polyether structures where both the amine and glycol functions contribute to their performance. The range of primary, secondary, and tertiary amines and structures allows the selection of base strength and corrosion rates based on the needs of the application.
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